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DOI | 10.1038/s41586-020-2297-6 |
Enhanced ferroelectricity in ultrathin films grown directly on silicon (vol 580, pg 478, 2020) | |
Tsai, Hanshen1,2; Higo, Tomoya1,2; Kondou, Kouta2,3; Nomoto, Takuya2,4; Sakai, Akito1,2; Kobayashi, Ayuko1; Nakano, Takafumi2,5; Yakushiji, Kay2,5; Arita, Ryotaro2,3,4; Miwa, Shinji1,2,6; Otani, Yoshichika1,2,3,6; Nakatsuji, Satoru1,2,6,7 | |
2020-04-20 | |
发表期刊 | NATURE
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ISSN | 0028-0836 |
EISSN | 1476-4687 |
出版年 | 2020 |
卷号 | 581期号:7808页码:E5-E5 |
文章类型 | Correction |
语种 | 英语 |
英文关键词 | An amendment to this paper has been published and can be accessed via a link at the top of the paper. |
领域 | 地球科学 ; 气候变化 ; 资源环境 |
收录类别 | SCI-E |
WOS记录号 | WOS:000531504100001 |
WOS类目 | Multidisciplinary Sciences |
WOS研究方向 | Science & Technology - Other Topics |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://119.78.100.173/C666/handle/2XK7JSWQ/281380 |
专题 | 地球科学 资源环境科学 气候变化 |
作者单位 | 1.Univ Tokyo, Inst Solid State Phys, Kashiwa, Chiba, Japan; 2.Japan Sci & Technol Agcy, CREST, Kawaguchi, Saitama, Japan; 3.RIKEN, CEMS, Wako, Saitama, Japan; 4.Univ Tokyo, Dept Appl Phys, Tokyo, Japan; 5.Natl Inst Adv Ind Sci & Technol, Spintron Res Ctr, Tsukuba, Ibaraki, Japan; 6.Univ Tokyo, Trans Scale Quantum Sci Inst, Tokyo, Japan; 7.Univ Tokyo, Dept Phys, Tokyo, Japan |
推荐引用方式 GB/T 7714 | Tsai, Hanshen,Higo, Tomoya,Kondou, Kouta,et al. Enhanced ferroelectricity in ultrathin films grown directly on silicon (vol 580, pg 478, 2020)[J]. NATURE,2020,581(7808):E5-E5. |
APA | Tsai, Hanshen.,Higo, Tomoya.,Kondou, Kouta.,Nomoto, Takuya.,Sakai, Akito.,...&Nakatsuji, Satoru.(2020).Enhanced ferroelectricity in ultrathin films grown directly on silicon (vol 580, pg 478, 2020).NATURE,581(7808),E5-E5. |
MLA | Tsai, Hanshen,et al."Enhanced ferroelectricity in ultrathin films grown directly on silicon (vol 580, pg 478, 2020)".NATURE 581.7808(2020):E5-E5. |
条目包含的文件 | 条目无相关文件。 |
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