Chemical vapor deposition of layered two-dimensional MoSi<sub>2</sub>N<sub>4</sub> materials

doi:10.1126/science.abb7023

GSTDTAP > 气候变化

DOI	10.1126/science.abb7023
	Chemical vapor deposition of layered two-dimensional MoSi₂N₄ materials
	Yi-Lun Hong; Zhibo Liu; Lei Wang; Tianya Zhou; Wei Ma; Chuan Xu; Shun Feng; Long Chen; Mao-Lin Chen; Dong-Ming Sun; Xing-Qiu Chen; Hui-Ming Cheng; Wencai Ren
	2020-08-07
发表期刊	Science
出版年	2020
英文摘要	Transition metal carbides and nitrides are nonlayered materials that in monolayer form have potentially useful electronic and chemical properties. These monolayers are usually made by chemical etching that produces flakes with surface defects that have poor air and water stability. Hong et al. report that introducing silicon during chemical vapor deposition growth of molybdenum nitride passivates the surface and prevents island formation. Centimeter-scale monolayer films of the semiconductor MoSi2N4 form as a MoN2 layer sandwiched by two Si-N bilayers. These layers possess high mechanical strength and ambient stability. Science , this issue p. [670][1] Identifying two-dimensional layered materials in the monolayer limit has led to discoveries of numerous new phenomena and unusual properties. We introduced elemental silicon during chemical vapor deposition growth of nonlayered molybdenum nitride to passivate its surface, which enabled the growth of centimeter-scale monolayer films of MoSi2N4. This monolayer was built up by septuple atomic layers of N-Si-N-Mo-N-Si-N, which can be viewed as a MoN2 layer sandwiched between two Si-N bilayers. This material exhibited semiconducting behavior (bandgap ~1.94 electron volts), high strength (~66 gigapascals), and excellent ambient stability. Density functional theory calculations predict a large family of such monolayer structured two-dimensional layered materials, including semiconductors, metals, and magnetic half-metals. [1]: /lookup/doi/10.1126/science.abb7023
领域	气候变化 ; 资源环境
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文献类型	期刊论文
条目标识符	http://119.78.100.173/C666/handle/2XK7JSWQ/288005
专题	气候变化资源环境科学
推荐引用方式 GB/T 7714	Yi-Lun Hong,Zhibo Liu,Lei Wang,et al. Chemical vapor deposition of layered two-dimensional MoSi₂N₄ materials[J]. Science,2020.
APA	Yi-Lun Hong.,Zhibo Liu.,Lei Wang.,Tianya Zhou.,Wei Ma.,...&Wencai Ren.(2020).Chemical vapor deposition of layered two-dimensional MoSi₂N₄ materials.Science.
MLA	Yi-Lun Hong,et al."Chemical vapor deposition of layered two-dimensional MoSi₂N₄ materials".Science (2020).