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DOI | 10.1126/science.aan2958 |
Direct optical lithography of functional inorganic nanomaterials | |
Wang, Yuanyuan1,2; Fedin, Igor1,2; Zhang, Hao1,2; Talapin, Dmitri V.1,2,3 | |
2017-07-28 | |
发表期刊 | SCIENCE |
ISSN | 0036-8075 |
EISSN | 1095-9203 |
出版年 | 2017 |
卷号 | 357期号:6349页码:385-388 |
文章类型 | Article |
语种 | 英语 |
国家 | USA |
英文摘要 | Photolithography is an important manufacturing process that relies on using photoresists, typically polymer formulations, that change solubility when illuminated with ultraviolet light. Here, we introduce a general chemical approach for photoresist-free, direct optical lithography of functional inorganic nanomaterials. The patterned materials can be metals, semiconductors, oxides, magnetic, or rare earth compositions. No organic impurities are present in the patterned layers, which helps achieve good electronic and optical properties. The conductivity, carrier mobility, dielectric, and luminescence properties of optically patterned layers are on par with the properties of state-of-the-art solution-processed materials. The ability to directly pattern all-inorganic layers by using a light exposure dose comparable with that of organic photoresists provides an alternate route for thin-film device manufacturing. |
领域 | 地球科学 ; 气候变化 ; 资源环境 |
收录类别 | SCI-E |
WOS记录号 | WOS:000406362300041 |
WOS关键词 | QUANTUM-DOT SOLIDS ; MATCHED MOLECULAR SOLDERS ; COLLOIDAL NANOCRYSTALS ; LOW-TEMPERATURE ; TRANSISTORS ; THIOCYANATE ; COMPOSITES ; LIGANDS |
WOS类目 | Multidisciplinary Sciences |
WOS研究方向 | Science & Technology - Other Topics |
URL | 查看原文 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://119.78.100.173/C666/handle/2XK7JSWQ/196551 |
专题 | 地球科学 资源环境科学 气候变化 |
作者单位 | 1.Univ Chicago, Dept Chem, Chicago, IL 60637 USA; 2.Univ Chicago, James Franck Inst, Chicago, IL 60637 USA; 3.Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USA |
推荐引用方式 GB/T 7714 | Wang, Yuanyuan,Fedin, Igor,Zhang, Hao,et al. Direct optical lithography of functional inorganic nanomaterials[J]. SCIENCE,2017,357(6349):385-388. |
APA | Wang, Yuanyuan,Fedin, Igor,Zhang, Hao,&Talapin, Dmitri V..(2017).Direct optical lithography of functional inorganic nanomaterials.SCIENCE,357(6349),385-388. |
MLA | Wang, Yuanyuan,et al."Direct optical lithography of functional inorganic nanomaterials".SCIENCE 357.6349(2017):385-388. |
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